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Walter Giurlani   Dr.  Graduate Student or Post Graduate 
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Walter Giurlani published an article in January 2019.
Top co-authors See all
Nicoletta DiTaranto

160 shared publications

Department of Chemistry, Università degli Studi di Bari “Aldo Moro”, via Orabona 4, 70125 Bari, Italy

M. Innocenti

133 shared publications

Dipartimento di Chimica, Università degli Studi di Firenze, via della Lastruccia 3, 50019 Sesto Fiorentino (FI), Italy

Alessandro Lavacchi

112 shared publications

Consiglio Nazionale delle Ricerche—Istituto di Chimica dei Composti OrganoMetallici (CNR-ICCOM), via Madonna del Piano 10, 50019 Sesto Fiorentino (FI), Italy

Stefano Caporali

64 shared publications

Dipartimento di Ingegneria Industriale, Università degli Studi di Firenze, Via S. Marta 3, 50139 Firenze, Italy;(N.C.);(S.C.)

Rosaria Anna Picca

55 shared publications

Chemistry Department, University of Bari Aldo Moro, Via E. Orabona 4, I-70125 Bari, Italy

11
Publications
42
Reads
17
Downloads
4
Citations
Publication Record
Distribution of Articles published per year 
(2017 - 2019)
Total number of journals
published in
 
7
 
Publications See all
Article 0 Reads 0 Citations Coating Thickness Determination Using X-ray Fluorescence Spectroscopy: Monte Carlo Simulations as an Alternative to the ... Walter Giurlani, Enrico Berretti, Massimo Innocenti, Alessan... Published: 29 January 2019
Coatings, doi: 10.3390/coatings9020079
DOI See at publisher website ABS Show/hide abstract
X-ray fluorescence is often employed in the measurement of the thickness of coatings. Despite its widespread nature, the task is not straightforward because of the complex physics involved, which results in high dependence on matrix effects. Thickness quantification is accomplished using the Fundamental Parameters approach, adjusted with empirical measurements of standards with known composition and thickness. This approach has two major drawbacks: (i) there are no standards for any possible coating and coating architecture and (ii) even relying on standards, the quantification of unknown samples requires the precise knowledge of the matrix nature (e.g., in the case of multilayer coatings the thickness and composition of each underlayer). In this work, we describe a semiquantitative approach to coating thickness measurement based on the construction of calibration curves through simulated XRF spectra built with Monte Carlo simulations. Simulations have been performed with the freeware software XMI-MSIM. We have assessed the accuracy of the methods by comparing the results with those obtained by (i) XRF thickness determination with standards and (ii) FIB-SEM cross-sectioning. Then we evaluated which parameters are critical in this kind of indirect thickness measurement.
Article 0 Reads 0 Citations Successes and Issues in the Growth of Moad and MoSe2 on Ag(111) by the E-ALD Method Martina Vizza, Andrea Giaccherini, Walter Giurlani, Maurizio... Published: 24 January 2019
Metals, doi: 10.3390/met9020122
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This paper explores the conditions for the electrodeposition of Moad (molybdenum adlayer) on Ag(111) from alkaline aqueous solution. Moreover, the first stages of the growth of MoSe2 are also presented, performing the deposition of Sead on the deposited Moad. The deposition of Moad on Sead/Ag(111) was also explored. MoSe2 is of interest due to its peculiar optoelectronic properties, making it suitable for solar energy conversion and nanoelectronics. In this study, electrodeposition techniques were exploited for the synthesis process as more sustainable alternatives to vacuum based techniques. The electrochemical atomic layer deposition (E-ALD) method emerges as a suitable technique to grow inorganic semiconductor thin films thanks to its fulfillment of the green energy predicament and a strict structural and morphological control, and this approach has gathered the attention of the scientific community. Indeed, E-ALD exploits surface limited reactions (SLRs) to alternate the deposition of chemically different atomic layers constituting a compound semiconductor. Thus, E-ALD is one of the most promising electrodeposition techniques for the growth of thin-film of compound semiconductors under a strict structural and morphological control. On this ground, E-ALD can be considered an ideal technique for the growth of 2D materials.
PREPRINT 0 Reads 0 Citations Coatings Thickness Determination Using X-ray Fluorescence Spectroscopy: Monte Carlo Simulations as an Alternative to the... Walter Giurlani, Enrico Berretti, Massimo Innocenti, Alessan... Published: 24 January 2019
doi: 10.20944/preprints201901.0244.v1
DOI See at publisher website ABS Show/hide abstract
X-ray fluorescence is largely employed in the measurement of the thickness of coatings. Despite of its diffusion, the task is not straightforward because of the complex physics involved that results in high dependence on matrix effects. Thickness quantification is in practice accomplished using the Fundamental Parameters approach, adjusted with empirical measurements of standards with known composition and thickness. This approach has two major drawbacks: i) there are no standards for any possible coating and coating architecture and ii) even relying on standards, the quantification of unknown samples requires the precise knowledge of the matrix nature (e.g., in case of multilayer coatings the thickness and the composition of each underlayer). In this work, we describe a semiquantitative approach to coatings thickness measurement based on the construction of calibration curves through simulated XRF spectra built with Monte Carlo simulations.  Simulations have been performed with the freeware software XMI-MSIM.  We have assessed the accuracy of the methods by comparing the results with those obtained by i) XRF thickness determination with standards and ii) FIB-SEM cross-sectioning. Then we evaluated which parameters are critical in this kind of indirect thickness measurements.
Article 0 Reads 0 Citations Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the... Walter Giurlani, Andrea Giaccherini, Nicola Calisi, Giovanni... Published: 14 August 2018
Materials, doi: 10.3390/ma11081426
DOI See at publisher website PubMed View at PubMed ABS Show/hide abstract
The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain highly controlled nanostructured depositions as needed, for the application of these materials for novel electronics (topological insulators), thermoelectrics and opto-electronics applications. Electrochemical studies have been conducted to determine the Underpotential Deposition (UPD) of Bi on selenium (Se) to obtain the Bi2Se3 compound on the Ag (111) electrode. Verifying the composition with X-ray Photoelectron Spectroscopy (XPS) showed that, after the first monolayer, the deposition of Se stopped. Thicker deposits were synthesized exploiting a time-controlled deposition of massive Se. We then investigated the optimal conditions to deposit a single monolayer of metallic Bi directly on the Ag.
Article 1 Read 0 Citations On the Contrasting Effect Exerted by a Thin Layer of CdS against the Passivation of Silver Electrodes Coated with Thiols Emanuele Salvietti, Walter Giurlani, Maria Luisa Foresti, Ma... Published: 31 July 2018
Surfaces, doi: 10.3390/surfaces1010004
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The passivation of metal electrodes covered by self-assembled monolayers of long-chain thiols is well known. The disappearance of the voltammetric peak of redox species in solution is a classical test for the formation of full layers of thiols. Similar studies on semiconductors are still very limited. We used silver surfaces covered by an ultrathin layer of CdS as substrate for self-assembling of n-hexadecanethiol (C16SH), and we compared the experimental results with those obtained by using the bare silver surface as substrate. The strong insulating effect of C16SH deposited on Ag(III) is shown by the inhibition of the voltammetric peak of Ru(NH3)63+/2+. On the contrary, the voltammogram obtained on CdS-covered Ag(III) is very similar to that obtained on the bare Ag(III) electrode, thus suggesting that the presence of CdS exerts a contrasting effect on the passivation of the silver electrode. A crucial point of our work is to demonstrate the effective formation of C16SH monolayers on Ag(III) covered by CdS. The formation of full layers of C16SH was strongly suggested by the inhibition of the stripping peak of Cd from the CdS deposit covered by C16SH. The presence of C16SH was confirmed by electrochemical quartz crystal microbalance (EQCM) measurements as well as by Auger electron spectroscopy (AES) analysis.
Article 3 Reads 1 Citation Electroplating for Decorative Applications: Recent Trends in Research and Development Walter Giurlani, Giovanni Zangari, Filippo Gambinossi, Mauri... Published: 25 July 2018
Coatings, doi: 10.3390/coatings8080260
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Electroplating processes are widely employed in industrial environments for a large variety of metallic coatings, ranging from technological to decorative applications. Even if the galvanic electrodeposition is certainly a mature technology, new concepts, novel applications, environmental legislation and the new material requirements for next-generation devices make the scientific research in this field still very active. This review focuses mostly at the decorative and wearable applications, and aims to create a bridge between the past knowledge and the future direction that this process, i.e., electrodeposition, is taking. Both the theoretical fundamentals as well as some of the most widespread practical applications—limited to metallic and alloy coatings—are explored. As an integral part of the industrial process, we take a look at the main techniques thought which the quality control of deposits and surfaces is carried out. Finally, global industrial performance and research directions towards sustainable solutions are highlighted.
Conference papers
CONFERENCE-ARTICLE 15 Reads 0 Citations Corrosion Resistance Test of Electroplated Metals using Fast Electrochemical Non-Destructive Analysis Walter Giurlani, Patrick Marcantelli, Francesco Benelli, Dan... Published: 13 March 2019
doi: 10.3390/ciwc2019-06159
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Corrosion testing is a very important step in quality control for metal industrial processes. Especially for electroplated goods, corrosion resistance is a primary indicator of surface quality. International Standard Organization has established several standards that use Electrochemical Impedance Spectroscopy (EIS), alone or combined with other electrochemical techniques, to determine corrosion resistance of metal surfaces such ISO 16773 for testing coated and uncoated metallic specimens and ISO 17463 specially designed for organic-coated metal surfaces. EIS is a versatile procedure for the accelerated evaluation of the anti-corrosion performance of coatings: unlike other standard procedures is generally a non-destructive method. EIS works applying an electrical sinusoidal perturbation with a fixed frequency and measuring electrical impedance Z of the sample. Measuring impedance at different frequencies and analysing the data it is possible to postulate the structure of an equivalent circuit and extract corrosion resistance data. This approach is commonly used for high-impedance coatings, in this study we will explore EIS as well as the OCP measurement, the corrosion current and other techniques to find the best option for low-impedance metallic coatings analysis. The objective of this study is to develop a method to determine corrosion resistance for electroplated goods that can give results as reliable as other more diffuse and traditional destructive corrosion testing techniques (such as corrosion tests in artificial atmosphere ISO 9227 and ISO 17228) with a non-destructive process and in a fair less amount of time.

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