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Walter Giurlani   Dr.  Graduate Student or Post Graduate 
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Walter Giurlani published an article in August 2018.
Top co-authors
Massimo Innocenti

13 shared publications

Department of Chemistry “Ugo Schiff”, University of Florence, via della Lastruccia 3, 50019 Sesto Fiorentino, Italy

6
Publications
26
Reads
8
Downloads
2
Citations
Publication Record
Distribution of Articles published per year 

Total number of journals
published in
 
5
 
Publications
Article 0 Reads 0 Citations Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the... Walter Giurlani, Andrea Giaccherini, Nicola Calisi, Giovanni... Published: 14 August 2018
Materials, doi: 10.3390/ma11081426
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The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain highly controlled nanostructured depositions as needed, for the application of these materials for novel electronics (topological insulators), thermoelectrics and opto-electronics applications. Electrochemical studies have been conducted to determine the Underpotential Deposition (UPD) of Bi on selenium (Se) to obtain the Bi2Se3 compound on the Ag (111) electrode. Verifying the composition with X-ray Photoelectron Spectroscopy (XPS) showed that, after the first monolayer, the deposition of Se stopped. Thicker deposits were synthesized exploiting a time-controlled deposition of massive Se. We then investigated the optimal conditions to deposit a single monolayer of metallic Bi directly on the Ag.
Article 1 Read 0 Citations On the Contrasting Effect Exerted by a Thin Layer of CdS against the Passivation of Silver Electrodes Coated with Thiols Emanuele Salvietti, Walter Giurlani, Maria Luisa Foresti, Ma... Published: 31 July 2018
Surfaces, doi: 10.3390/surfaces1010004
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The passivation of metal electrodes covered by self-assembled monolayers of long-chain thiols is well known. The disappearance of the voltammetric peak of redox species in solution is a classical test for the formation of full layers of thiols. Similar studies on semiconductors are still very limited. We used silver surfaces covered by an ultrathin layer of CdS as substrate for self-assembling of n-hexadecanethiol (C16SH), and we compared the experimental results with those obtained by using the bare silver surface as substrate. The strong insulating effect of C16SH deposited on Ag(III) is shown by the inhibition of the voltammetric peak of Ru(NH3)63+/2+. On the contrary, the voltammogram obtained on CdS-covered Ag(III) is very similar to that obtained on the bare Ag(III) electrode, thus suggesting that the presence of CdS exerts a contrasting effect on the passivation of the silver electrode. A crucial point of our work is to demonstrate the effective formation of C16SH monolayers on Ag(III) covered by CdS. The formation of full layers of C16SH was strongly suggested by the inhibition of the stripping peak of Cd from the CdS deposit covered by C16SH. The presence of C16SH was confirmed by electrochemical quartz crystal microbalance (EQCM) measurements as well as by Auger electron spectroscopy (AES) analysis.
Article 3 Reads 0 Citations Electroplating for Decorative Applications: Recent Trends in Research and Development Walter Giurlani, Giovanni Zangari, Filippo Gambinossi, Mauri... Published: 25 July 2018
Coatings, doi: 10.3390/coatings8080260
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Electroplating processes are widely employed in industrial environments for a large variety of metallic coatings, ranging from technological to decorative applications. Even if the galvanic electrodeposition is certainly a mature technology, new concepts, novel applications, environmental legislation and the new material requirements for next-generation devices make the scientific research in this field still very active. This review focuses mostly at the decorative and wearable applications, and aims to create a bridge between the past knowledge and the future direction that this process, i.e., electrodeposition, is taking. Both the theoretical fundamentals as well as some of the most widespread practical applications—limited to metallic and alloy coatings—are explored. As an integral part of the industrial process, we take a look at the main techniques thought which the quality control of deposits and surfaces is carried out. Finally, global industrial performance and research directions towards sustainable solutions are highlighted.
CONFERENCE-ARTICLE 28 Reads 0 Citations <strong>Investigations on the Electrochemical Atomic Layer Growth of Bi<sub>2</sub>Se<sub>3</sub> and the Surface Limite... Walter Giurlani, Andrea Giaccherini, Nicola Calisi, Giovanni... Published: 21 May 2018
The 3rd International Electronic Conference on Materials Sciences, doi: 10.3390/ecms2018-05242
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The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin film of bismuth (Bi) compounds. Exploiting the E-ALD it was possible to obtain high controlled nanostructured depositions as needed for the application of these materials for novel electronics (topological insulators) and opto-electronics applications. Electrochemical studies have been conducted to determine the Underpotential Deposition (UPD) of Bi on selenium (Se) to obtain the Bi2Se3 compound on the Ag (111) electrode. Verifying the composition with the X-ray Photoelectron Spectroscopy (XPS) emerged that, after the first monolayer, the deposition of Se is stopped. Thicker deposits were synthesized exploiting a time-controlled deposition of massive Se. Then we move to discover the optimal conditions to deposit a single monolayer of metallic Bi directly on Ag.

Article 1 Read 2 Citations X-ray Microanalysis of Precious Metal Thin Films: Thickness and Composition Determination Walter Giurlani, Massimo Innocenti, Alessandro Lavacchi Published: 24 February 2018
Coatings, doi: 10.3390/coatings8020084
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Measuring the thickness and the composition of precious metal thin films is a challenging task. Currently, the available techniques for thickness measurements are either destructive or need heavy assumptions on the nature of the sample, relying on information that are not always available with sufficient accuracy. In this paper we propose a new methodology based on X-ray microanalysis that can complement, with better lateral resolution, the use of X-ray Fluorescence, the most widely employed technique for measuring the thickness of electrodeposited coatings. The proposed method employs a combination of energy dispersive microanalysis spectra acquisition and Monte Carlo simulation. The effectiveness of the technique has been demonstrated by the measure of the thickness and the composition of a thin 24 kt gold electroplated film that contained small amount of nickel. Results have been validated by comparing data with those obtained by X-ray fluorescence and the scanning electron microscopy of metallographic cross-sections.
Article 0 Reads 1 Citation Color Measurements in Electroplating Industry: Implications for Product Quality Control Walter Giurlani, Filippo Gambinossi, Emanuele Salvietti, Mau... Published: 25 October 2017
ECS Transactions, doi: 10.1149/08010.0757ecst
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