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Stefano Caporali   Dr.  Post Doctoral Researcher 
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Stefano Caporali published an article in November 2018.
Research Keywords & Expertise See all
0 A
0 Adsorption
0 Heterogeneous Catalysis
0 Ionic Liquids
0 Nanoparticles
0 Platinum
Top co-authors See all
Frank Hollmann

181 shared publications

Department of Biotechnology, Delft University of Technology, van der Maasweg 9, 2629 HZ Delft, The Netherlands

Ugo Bardi

152 shared publications

Chemistry Department, University of Florence, Sesto Fiorentino, Italy

Pierluigi Barbaro

90 shared publications

Consiglio Nazionale delle Ricerche; Istituto di Chimica dei Composti Organo Metallici; Via Madonna del Piano 10 50019 Sesto Fiorentino Firenze Italy

Giovanni Pratesi

52 shared publications

Dipartimento di Scienze della Terra, Università degli Studi di Firenze, Via La Pira 4, 50121 Firenze, Italy

Roman Skála

49 shared publications

Institute of Geochemistry, Mineralogy and Mineral Resources, Faculty of Science, Charles University in Prague, Albertov 6, Czech Republic

58
Publications
68
Reads
17
Downloads
297
Citations
Publication Record
Distribution of Articles published per year 
(2004 - 2018)
Total number of journals
published in
 
41
 
Publications See all
Article 0 Reads 0 Citations SERS, XPS and DFT investigation on palladium surfaces coated with 2,2′-bipyridine monolayers Maurizio Muniz-Miranda, Francesco Muniz-Miranda, Stefano Cap... Published: 01 November 2018
Applied Surface Science, doi: 10.1016/j.apsusc.2018.06.232
DOI See at publisher website
Article 0 Reads 0 Citations Stereoselective Double Reduction of 3-Methyl-2-cyclohexenone, by Use of Palladium and Platinum Nanoparticles, in Tandem ... Francesca Coccia, Lucia Tonucci, Piero Del Boccio, Stefano C... Published: 19 October 2018
Nanomaterials, doi: 10.3390/nano8100853
DOI See at publisher website ABS Show/hide abstract
The combination of metal nanoparticles (Pd or Pt NPs) with NAD-dependent thermostable alcohol dehydrogenase (TADH) resulted in the one-flask catalytic double reduction of 3-methyl-2-cyclohexenone to 3-(1S,3S)-methylcyclohexanol. In this article, some assumptions about the interactions between a chemocatalyst and a biocatalyst have been proposed. It was demonstrated that the size of the NPs was the critical parameter for the mutual inhibition: the bigger the NPs, the more harmful for the enzyme they were, even if the NPs themselves were only moderately inactivated. Conversely, the smaller the NPs, the more minimal the TADH denaturation, although they were dramatically inhibited. Resuming, the chemocatalysts were very sensitive to deactivation, which was not related to the amount of enzyme used, while the inhibition of the biocatalyst can be strongly reduced by minimizing the NPs/TADH ratio used to catalyze the reaction. Among some methods to avoid direct binding of NPs with TADH, we found that using large Pd NPs and protecting their surfaces with a silica shell, the overall yield of 3-(1S,3S)-methylcyclohexanol was maximized (36%).
Article 0 Reads 1 Citation Low-Temperature Continuous-Flow Dehydration of Xylose Over Water-Tolerant Niobia-Titania Heterogeneous Catalysts Carmen Moreno-Marrodan, Pierluigi Barbaro, Stefano Caporali,... Published: 24 September 2018
ChemSusChem, doi: 10.1002/cssc.201801414
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Article 0 Reads 0 Citations Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the... Walter Giurlani, Andrea Giaccherini, Nicola Calisi, Giovanni... Published: 14 August 2018
Materials, doi: 10.3390/ma11081426
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The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain highly controlled nanostructured depositions as needed, for the application of these materials for novel electronics (topological insulators), thermoelectrics and opto-electronics applications. Electrochemical studies have been conducted to determine the Underpotential Deposition (UPD) of Bi on selenium (Se) to obtain the Bi2Se3 compound on the Ag (111) electrode. Verifying the composition with X-ray Photoelectron Spectroscopy (XPS) showed that, after the first monolayer, the deposition of Se stopped. Thicker deposits were synthesized exploiting a time-controlled deposition of massive Se. We then investigated the optimal conditions to deposit a single monolayer of metallic Bi directly on the Ag.
Article 1 Read 0 Citations On the Contrasting Effect Exerted by a Thin Layer of CdS against the Passivation of Silver Electrodes Coated with Thiols Emanuele Salvietti, Walter Giurlani, Maria Luisa Foresti, Ma... Published: 31 July 2018
Surfaces, doi: 10.3390/surfaces1010004
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The passivation of metal electrodes covered by self-assembled monolayers of long-chain thiols is well known. The disappearance of the voltammetric peak of redox species in solution is a classical test for the formation of full layers of thiols. Similar studies on semiconductors are still very limited. We used silver surfaces covered by an ultrathin layer of CdS as substrate for self-assembling of n-hexadecanethiol (C16SH), and we compared the experimental results with those obtained by using the bare silver surface as substrate. The strong insulating effect of C16SH deposited on Ag(III) is shown by the inhibition of the voltammetric peak of Ru(NH3)63+/2+. On the contrary, the voltammogram obtained on CdS-covered Ag(III) is very similar to that obtained on the bare Ag(III) electrode, thus suggesting that the presence of CdS exerts a contrasting effect on the passivation of the silver electrode. A crucial point of our work is to demonstrate the effective formation of C16SH monolayers on Ag(III) covered by CdS. The formation of full layers of C16SH was strongly suggested by the inhibition of the stripping peak of Cd from the CdS deposit covered by C16SH. The presence of C16SH was confirmed by electrochemical quartz crystal microbalance (EQCM) measurements as well as by Auger electron spectroscopy (AES) analysis.
Article 3 Reads 0 Citations Electroplating for Decorative Applications: Recent Trends in Research and Development Walter Giurlani, Giovanni Zangari, Filippo Gambinossi, Mauri... Published: 25 July 2018
Coatings, doi: 10.3390/coatings8080260
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Electroplating processes are widely employed in industrial environments for a large variety of metallic coatings, ranging from technological to decorative applications. Even if the galvanic electrodeposition is certainly a mature technology, new concepts, novel applications, environmental legislation and the new material requirements for next-generation devices make the scientific research in this field still very active. This review focuses mostly at the decorative and wearable applications, and aims to create a bridge between the past knowledge and the future direction that this process, i.e., electrodeposition, is taking. Both the theoretical fundamentals as well as some of the most widespread practical applications—limited to metallic and alloy coatings—are explored. As an integral part of the industrial process, we take a look at the main techniques thought which the quality control of deposits and surfaces is carried out. Finally, global industrial performance and research directions towards sustainable solutions are highlighted.
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