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Massimo Innocenti      
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Massimo Innocenti published an article in January 2019.
Top co-authors See all
Luigi Messori

267 shared publications

Laboratory of Metals in Medicine (MetMed), Department of Chemistry “U. Schiff”, University of Florence, Via della Lastruccia 3, 50019 Sesto Fiorentino, Italy

Antonio Bianchi

258 shared publications

Department of Chemistry “Ugo Schiff”, University of Florence, via della Lastruccia 3, 50019 Sesto Fiorentino, Italy

Francesco Vizza

197 shared publications

National Research Council of Italy CNR-ICCOM – Via Madonna del Piano 10, 50019 Sesto Fiorentino (FI), Italy

Nicoletta DiTaranto

160 shared publications

Department of Chemistry, Università degli Studi di Bari “Aldo Moro”, via Orabona 4, 70125 Bari, Italy

Alessandro Lavacchi

112 shared publications

Consiglio Nazionale delle Ricerche—Istituto di Chimica dei Composti OrganoMetallici (CNR-ICCOM), via Madonna del Piano 10, 50019 Sesto Fiorentino (FI), Italy

131
Publications
67
Reads
18
Downloads
170
Citations
Publication Record
Distribution of Articles published per year 
(1993 - 2019)
Total number of journals
published in
 
32
 
Publications See all
Article 0 Reads 0 Citations Coating Thickness Determination Using X-ray Fluorescence Spectroscopy: Monte Carlo Simulations as an Alternative to the ... Walter Giurlani, Enrico Berretti, Massimo Innocenti, Alessan... Published: 29 January 2019
Coatings, doi: 10.3390/coatings9020079
DOI See at publisher website ABS Show/hide abstract
X-ray fluorescence is often employed in the measurement of the thickness of coatings. Despite its widespread nature, the task is not straightforward because of the complex physics involved, which results in high dependence on matrix effects. Thickness quantification is accomplished using the Fundamental Parameters approach, adjusted with empirical measurements of standards with known composition and thickness. This approach has two major drawbacks: (i) there are no standards for any possible coating and coating architecture and (ii) even relying on standards, the quantification of unknown samples requires the precise knowledge of the matrix nature (e.g., in the case of multilayer coatings the thickness and composition of each underlayer). In this work, we describe a semiquantitative approach to coating thickness measurement based on the construction of calibration curves through simulated XRF spectra built with Monte Carlo simulations. Simulations have been performed with the freeware software XMI-MSIM. We have assessed the accuracy of the methods by comparing the results with those obtained by (i) XRF thickness determination with standards and (ii) FIB-SEM cross-sectioning. Then we evaluated which parameters are critical in this kind of indirect thickness measurement.
Article 0 Reads 0 Citations Successes and Issues in the Growth of Moad and MoSe2 on Ag(111) by the E-ALD Method Martina Vizza, Andrea Giaccherini, Walter Giurlani, Maurizio... Published: 24 January 2019
Metals, doi: 10.3390/met9020122
DOI See at publisher website ABS Show/hide abstract
This paper explores the conditions for the electrodeposition of Moad (molybdenum adlayer) on Ag(111) from alkaline aqueous solution. Moreover, the first stages of the growth of MoSe2 are also presented, performing the deposition of Sead on the deposited Moad. The deposition of Moad on Sead/Ag(111) was also explored. MoSe2 is of interest due to its peculiar optoelectronic properties, making it suitable for solar energy conversion and nanoelectronics. In this study, electrodeposition techniques were exploited for the synthesis process as more sustainable alternatives to vacuum based techniques. The electrochemical atomic layer deposition (E-ALD) method emerges as a suitable technique to grow inorganic semiconductor thin films thanks to its fulfillment of the green energy predicament and a strict structural and morphological control, and this approach has gathered the attention of the scientific community. Indeed, E-ALD exploits surface limited reactions (SLRs) to alternate the deposition of chemically different atomic layers constituting a compound semiconductor. Thus, E-ALD is one of the most promising electrodeposition techniques for the growth of thin-film of compound semiconductors under a strict structural and morphological control. On this ground, E-ALD can be considered an ideal technique for the growth of 2D materials.
PREPRINT 0 Reads 0 Citations Coatings Thickness Determination Using X-ray Fluorescence Spectroscopy: Monte Carlo Simulations as an Alternative to the... Walter Giurlani, Enrico Berretti, Massimo Innocenti, Alessan... Published: 24 January 2019
doi: 10.20944/preprints201901.0244.v1
DOI See at publisher website ABS Show/hide abstract
X-ray fluorescence is largely employed in the measurement of the thickness of coatings. Despite of its diffusion, the task is not straightforward because of the complex physics involved that results in high dependence on matrix effects. Thickness quantification is in practice accomplished using the Fundamental Parameters approach, adjusted with empirical measurements of standards with known composition and thickness. This approach has two major drawbacks: i) there are no standards for any possible coating and coating architecture and ii) even relying on standards, the quantification of unknown samples requires the precise knowledge of the matrix nature (e.g., in case of multilayer coatings the thickness and the composition of each underlayer). In this work, we describe a semiquantitative approach to coatings thickness measurement based on the construction of calibration curves through simulated XRF spectra built with Monte Carlo simulations.  Simulations have been performed with the freeware software XMI-MSIM.  We have assessed the accuracy of the methods by comparing the results with those obtained by i) XRF thickness determination with standards and ii) FIB-SEM cross-sectioning. Then we evaluated which parameters are critical in this kind of indirect thickness measurements.
Article 0 Reads 1 Citation MWCNTs-Supported Pd(II) Complexes with High Catalytic Efficiency in Oxygen Reduction Reaction in Alkaline Media Maurizio Passaponti, Matteo Savastano, M. Paz Clares, Mario ... Published: 24 October 2018
Inorganic Chemistry, doi: 10.1021/acs.inorgchem.8b02695
DOI See at publisher website
Article 2 Reads 1 Citation Effect of Electrode Shape and Flow Conditions on the Electrochemical Detection with Band Microelectrodes Maher Al Khatib, Marco Bellini, Rebecca Pogni, Andrea Giacch... Published: 21 September 2018
Sensors, doi: 10.3390/s18103196
DOI See at publisher website PubMed View at PubMed ABS Show/hide abstract
In this work, we report the analysis of the electrochemical detection of electroactive species with band microelectrodes that operate under controlled convection. The study focuses on the determination of the collection efficiency of the analyte as a function of inlet flow velocity and microband geometry (inlaid, bumped and recessed), also providing a straightforward method for the theoretical determination of the lower detection limit. The analysis has been carried out by simulating the dimensionless mass transport with the finite element method, delivering the stationary limiting current density. Simulations have been performed on systems consisting of single and double band electrodes to investigate the trail effect on the electrochemical detection. We show that the obtained dimensionless results can be easily turned into dimensional data, providing a tool for the design of devices. The proposed method is general and can easily be extended to systems with different geometry.
Article 0 Reads 0 Citations Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the... Walter Giurlani, Andrea Giaccherini, Nicola Calisi, Giovanni... Published: 14 August 2018
Materials, doi: 10.3390/ma11081426
DOI See at publisher website PubMed View at PubMed ABS Show/hide abstract
The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain highly controlled nanostructured depositions as needed, for the application of these materials for novel electronics (topological insulators), thermoelectrics and opto-electronics applications. Electrochemical studies have been conducted to determine the Underpotential Deposition (UPD) of Bi on selenium (Se) to obtain the Bi2Se3 compound on the Ag (111) electrode. Verifying the composition with X-ray Photoelectron Spectroscopy (XPS) showed that, after the first monolayer, the deposition of Se stopped. Thicker deposits were synthesized exploiting a time-controlled deposition of massive Se. We then investigated the optimal conditions to deposit a single monolayer of metallic Bi directly on the Ag.
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